NANOMEZ-3500F:Fully-Automatic WLI 3D Profilometer for Nano Roughness & Micro CD Measurement

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🔬 NANOMEZ-3500F

Fully-Automatic WLI 3D Profilometer for Nano Roughness & Micro CD Measurement

nanomez
nanomez

🌟 Introduction

The NANOMEZ-3500F represents the pinnacle of non-contact surface metrology.
Built on cutting-edge White Light Interferometry (WLI) technology, this fully-automatic 3D profilometer is engineered to provide ultra-precise topography measurements — from 1 nm up to 10 mm in height — with nanometric resolution, unmatched repeatability, and no contact-induced artifacts.

Tailored for semiconductor metrology, nano-engineering, and micro-structural analysis, the NANOMEZ-3500F offers exceptional performance in micro Critical Dimension (CD) analysis and 3D roughness characterization.

🔧 Key Features

  • Ultra-High Height Resolution: Down to 0.1 nm

  • Consistent Resolution Across Objectives: Maintain peak performance across magnification levels

  • Wide Measurement Range: From nanometers to centimeters, ideal for multiscale analysis

  • High-Speed 3D Scanning: Fast throughput without compromising accuracy

  • Non-Contact & Non-Destructive: No sample preparation required

  • Transparent Sample Compatibility: Effectively measures transparent, semi-transparent, or milky materials

  • Unrestricted Z-axis Height: No limitations on sample thickness or geometry

  • Superior Repeatability & Reproducibility

📏 Measurement Capabilities

  • 3D Surface Profiling: Capture accurate surface topography at nano resolution

  • Nano Roughness Analysis: Quantify fine-scale surface texture with extreme sensitivity

  • Critical Dimension (CD): Precise measurement of micro-scale line widths and feature sizes

  • Step Height & Depth: Analyze etch depths, film thicknesses, and structural layers

  • Curvature & Flatness: Detect warpage or deformation in thin films and wafers

  • Stress Mapping: Infer stress distribution from topographic curvature

  • Geometrical Measurements: Height, width, diameter, angle, radius, distance, volume, area

  • Defect & Wear Inspection: Identify micro-scratches, abrasions, and surface anomalies

  • Particle Analysis: Size and profile particles in contamination-sensitive environments

  • Waveform Profiling: Capture sinusoidal or irregular surface patterns for optical components

🧪 Applications

  • Semiconductor wafer topography

  • Micro/nano device fabrication QC

  • MEMS/NEMS structural analysis

  • Wafer bump & TSV shape evaluation

  • Transparent layer and coating analysis

  • Biomedical device surface inspection

  • Photonics and optical surface characterization

  • Thin film stress and deformation study

⚙️ Why NANOMEZ-3500F?

The NANOMEZ-3500F is not just another WLI profiler — it’s a metrology platform built for next-generation precision engineering. Whether you are measuring the line width of a critical mask feature, evaluating the roughness of a polished wafer, or profiling the curved surface of a MEMS device, this system delivers high confidence, high fidelity, and high throughput.

Its modular optical architecture and software-driven automation make it ideal for R&D labs, inline inspection, and cleanroom environments requiring traceable, repeatable, and quantitative 3D data.

📌 Summary

Specification Description
Measurement Type Non-contact, WLI-based 3D Profiling
Height Range 1 nm to 10 mm
Height Resolution 0.1 nm
Scan Speed High-speed automated measurement
Sample Type Opaque, Transparent, Thin, Large
Key Metrics Roughness, Step Height, CD, Area, Volume, Curvature, Angle
kovis email
kovis email

👉 Contact us now to get an optimized setup recommendation for your process and samples.

We’re Here to Help
We warmly welcome any inquiries regarding product specifications or pricing.
With English-speaking staff on our team, we’re well-prepared to assist you efficiently and clearly.
Please don’t hesitate to contact me directly — I will personally respond to your email.
You can reach me at: hy.kang@kovistek.com

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