As technology continues to evolve, the demand for working at ever-smaller scales intensifies.
In an era where precision down to the nanometer (nm) level is no longer optional but essential,
one solution stands out above the rest — FIB (Focused Ion Beam) systems.
Among them, the NanoFIB-7X emerges as a premium-class nanobeam FIB system,
delivering unmatched precision, flexibility, and control.
Utilizing a finely focused gallium (Ga) ion beam, it enables advanced nano-patterning,
high-resolution structural analysis, and precise sample preparation —
capabilities that were previously unimaginable with conventional tools.
NanoFIB-7X: Redefining Precision and Possibilities
Take Your Research and Development to the Next Level
✅ Precise Cross-Section Milling & 3D Structural Analysis
Reveal nano-scale structures, multilayer films, and hidden defects with incredible accuracy.
NanoFIB-7X enables rapid 3D analysis and root cause failure investigation,
allowing even the most complex structures to be clearly visualized.
✅ High-Quality TEM Sample Preparation
Quickly and precisely prepare ultra-thin TEM specimens down to just a few nanometers,
minimizing damage and maximizing success rates in TEM analysis.
Save both research time and operational costs.
✅ Semiconductor Circuit Modification & Debugging
Encountered circuit errors? No need to redo masks or repeat wafer processes.
With localized deposition and cutting capabilities,
NanoFIB-7X performs fast and precise circuit modifications,
significantly shortening product development cycles.
✅ Ultra-Fine Patterning & Nano Mold Fabrication
Utilizing vector scan-based high-resolution processing technology,
NanoFIB-7X enables fabrication of nano-optical devices, bio sensors,
and MEMS components with 2D/3D patterns and nano-scale molds.
It empowers researchers to bring creative ideas to life
and offers manufacturers next-level precision in production.
✅ Direct 3D Nano Structure Fabrication
Through advanced ion beam-induced deposition (IBID) using reactive gases,
you can directly build complex 3D nano structures —
ideal for next-gen technologies such as nano-robots, nano-sensors, and biomedical devices.
Key Specifications
| Specification | Details |
|---|---|
| Acceleration Voltage Range | 1.0 ~ 30 kV |
| Imaging Resolution | 5 nm @ 30 kV |
| Maximum Beam Current | ≥ 50 nA |
| Detectors | Secondary Electron Detector (Standard) Secondary Ion Detector (Optional) |
| Sample Stage | 5-Axis Eucentric Tilting Motorized Stage |
NanoFIB-7X: The New Standard for the Nano World
We are now in an era that demands not just observation,
but also precise control and experimental freedom.
The NanoFIB-7X goes beyond expectations, unlocking new frontiers
for researchers and engineers seeking ultimate precision and performance.
Ready to Transform Your Research?
If your work demands the highest level of precision at the nano scale,
it’s time to take your research and technology to the next stage with NanoFIB-7X.
Let innovation begin — right here, right now.
We’re Here to Help
We warmly welcome any inquiries regarding product specifications or pricing.
With English-speaking staff on our team, we’re well-prepared to assist you efficiently and clearly.
Please don’t hesitate to contact me directly — I will personally respond to your email.
You can reach me at: hy.kang@kovistek.com